Zirconia Thin Film VS Hafnium Oxide Thin Film

Thin film is a thin and soft transparent sheet, which is made of plastics, adhesives, rubber or other materials. It is a kind of two-dimensional material which is formed on the surface of the substrate by atoms, molecules or ions.

There are several thin films:

optical film, composite film, superconducting film, polyester film, nylon film, plastic film and so on.

Thin films are widely used in electronics, machinery, printing and other industries.

Thin film materials refer to thin metal or organic layers with thickness ranging from a single atom to a few millimeters. Electronic semiconductor functional devices and optical coatings are the main applications of thin film technology.

Zirconia (ZrO2) has the characteristics of hardness, compactness and inhomogeneity. The film needs to be dried to remove its absorption.

The purity and importance of the material are not sufficient. The film usually lacks overall compactness. It benefits from the proper use of IAD to increase its refractive index to porosity to overcome its inhomogeneity. The purity reaches 99.99% base.

SAINTY et al. have successfully used ZRO2 as a protective film for aluminum and silver films. The ZRO2 film is obtained by using 700EV argon ion as a plating aid on room temperature substrates. It is generally white columnar or block, and the evaporation molecules are ZRO, O2.

Hafnium oxide (HfO2) is one of the most important high refractive index materials in ultraviolet to near infrared (UV-NIR) band. It has high band gap, high laser damage threshold, corrosion resistance and easy preparation. It is widely used in laser optical thin films, especially in the field of laser thin films with high damage threshold.

The combination of hafnium oxide film and low refractive index silica film can be used to fabricate high reflective film, antireflective film, polarized light splitting film, filter film and other optical thin film components.

The preparation methods of hafnium oxide thin films mainly include electron beam evaporation, ion beam sputtering, magnetron sputtering, atomic layer deposition and other physical vapor deposition techniques.

The

hafnium oxide thin films prepared by ion beam sputtering have the advantages of small absorption, amorphous structure, low optical scattering, small defect density and so on, and have become the Important process to prepare hafnium oxide thin films.